SSAF Aghios Nikolaos, Crete 7-8.9. 2007 V.Havránek - New 3MV Tandetron Laboratory at NPI Rez New...

V.Havránek - New 3MV Tandetron Laboratory at NPI RezSSAF Aghios Nikolaos, Crete 7-8.9. 2007

New Tandetron Laboratory at NPINew Tandetron Laboratory at NPI

Vladimír Havránek, Vladimír Hnatowicz, Anna Macková,Vratislav Peřina, Jiří Vacík, Václav Voseček, Jiří Novotný, Jiří Bočan

Nuclear Physics Institute ASCR, 250 68 Řež u Prahy


Important Milestones

• 1964 3.5(5)MV Van de Graaff started operate

• 2005 3MV Tandetron 4130MC from HVEE installed

(supported by IAEA and ASCR)


V.Havránek - New 3MV Tandetron Laboratory at NPI Rez

+

Odkrytý 1985


Ion lines at the old VdG accelerator


New experinmentaltarget chamber forsimultaneous IBA



Present-day research activities at VdG

• Investigation of thin surface layers and multilayers with distinctive mechanical, electrical, magnetical, optical, chemical and biological properties, proceses of its fabrication

• Atmospherical and combustion aerosols research, testing of new reference materials, analysis of biological and environmental samples

• Comercial, industry and technological research activities


VdG 2004


Construction of the new Tandetron hall autumn– 2004






Tandetron hall summer 2005

V.Havránek - New 3MV Tandetron Laboratory at NPI RezSSAF Aghios Nikolaos, Crete 7-8.9. 2007Transport of Tandetron into new hall 1.9.2005







November 2005


Experimental lines

•Ion Channeling + RBS (NEC) 2006 (-30deg)

•High Energy Implantation line + RBS+ TOF ERDA (NEC, HVEE, Vacuum Praha, INP) 2006 (-10deg)

•Multipurpose for Simultaneous PIXE, PIGE, RBS, PESA and other Experimets (Vacuum Praha, INP) 2007 (+30deg)

•Ion Microprobe (Oxford Microbeams) 2008 (+10deg)


Summer 2006

PIXE, PIGE, RBS, PESA (2007)

Microbeam (2008)

Ion Chanelling (2006)

RBS TOF-ERDA

Implantation





High Energy Implantation Line•Carrousel for 12 samples of 2,5 inch in diameter. •Step motor control of the carrousel movement•Maximum energy 2.5MeV per charge state. •For Si4+ it is 10MeV, for H+ 2.5MeV. The lowest available energy is about 300keV• The typical implanted doses range from 1x108 to 1x1016 ions/cm2.


Ion Energy [keV]

Dose [at/cm2] Substrate Time to complete

H + 300 1x1014 Si 1h 40m

H+ 2500 5x1010 Si 30s

H+ 2500 1x1014 Polyaniline 36 m

Au + 1700 1x1016 Glass 16 h

Au 2+ 3000 1x1016 * Si 2.5 h

O + 2000 1x1014 PEEK 1 h

Si 5+ 12000 1x109 PET 2 s

Some examples of implanted ions

* Small scan area


Example of TOF-ERDA spectrometer tests. Spectra of LiF (200 nm) deposited on glassy carbon. 15,4 MeV Cu6+ (Tv =2,2 MV)

Start detectorTOF-ERDA

The TOF-ERDA spectrometer set into operation in 2006 withsupport and cooperation of Rossendorf group., The system consist of thin carbon foil start detector and particle energy detector, which also provides the stop time signal. In the

near future the second stop detector will be add.


RBS-ChannelingThe RBS-Channelling setup is only equipment which was fully supplied by external vendor. It was bought from NEC company USA and recently installed at -30 deg. beam line. The target chamber is equipped with fine goniometer with five degrees of freedom (x,y,z,,) and two charge particle detectors. Test experiments are now in progress. There is also a possibility to add additional x or -ray detector, so the PIXE or PIGE channelling experiments can be performed in future. The setup will be used for routine RBS-channelling and RBS measurements.

Channeling software


Proposed microbeam line


Thank you for your attention

Vltava River in Rez

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SSAF Aghios Nikolaos, Crete 7-8.9. 2007 V.Havránek - New 3MV Tandetron Laboratory at NPI Rez New...

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